Is the Manifold Kept Hot in CVD Semiconductor Process?
Chemical Vapor Deposition (CVD) is a cornerstone of semiconductor manufacturing, enabling precise thin-film deposition on wafers. In this process, the gas manifold—responsible for delivering precursor gases—plays a critical role in maintaining reaction stability. While substrates reach high temperatures like 600-1000°C, manifolds are often intentionally kept warm, but not as hot as the reaction chamber, to […]











